Daliang Wang

Title: Daliang Wang: Innovator in Polymer Thin Film Technology

Introduction

Daliang Wang is a notable inventor based in Jiaxing, China, recognized for his contributions to the field of polymer thin film technology. With a total of three patents to his name, Wang has made significant strides in developing methods and apparatuses that enhance the performance and application of polymer materials.

Latest Patents

One of Wang's latest patents is a method and apparatus for poling polymer thin films. This innovative poling apparatus is designed for poling a polymer thin film formed on a workpiece carried by a workpiece carrier. The workpiece features grounding electrodes and grounding pads located at the edges, with a thin film covering the grounding electrodes while exposing the grounding pads. The workpiece carrier is equipped with carrier electrodes positioned around the workpiece and inside grounding ports at the bottom. The poling apparatus includes a poling chamber with a poling source that generates plasma, a Z-elevator to raise the workpiece carrier toward the poling source using the grounding ports, and grounding mechanisms that connect the grounding pads of the workpiece with the carrier electrodes when the workpiece carrier is elevated. Additionally, the apparatus features a preparation platform and a transfer platform with conveyor systems that utilize rollers and Z-elevators to facilitate the movement of the workpiece carrier in and out of the poling chamber.

Career Highlights

Throughout his career, Daliang Wang has worked with several companies, including Creesense Microsystems Inc. and Areesys Technologies, Inc. His experience in these organizations has contributed to his expertise in polymer technology and innovation.

Collaborations

Wang has collaborated with notable colleagues such as Hongwei Lu and Albert Ting, further enhancing his work in the field of polymer thin films.

Conclusion

Daliang Wang's innovative work in polymer thin film technology, along with his patents and collaborations, showcases his significant contributions to the field. His advancements continue to influence the development of new materials and applications.