Dale E Ibbotson

Title: Dale E Ibbotson: Innovator in Plasma Etch Processes

Introduction

Dale E Ibbotson is a notable inventor based in Bridgewater, NJ (US). He has made significant contributions to the field of integrated circuit fabrication, particularly in the area of plasma etch processes. With a total of 3 patents, Ibbotson's work has advanced the understanding and efficiency of manufacturing processes in the semiconductor industry.

Latest Patents

One of Ibbotson's latest patents is titled "Active neural network determination of endpoint in a plasma etch process." This invention leverages the process signature from a plasma process used in fabricating integrated circuits. It identifies variations in the fabrication process, such as the age of the plasma reactor and the chemistry of the plasma. The method utilizes neural networks to determine plasma etch end-point times based on in-situ monitoring of parameters during the etch process. Once trained, the neural network can effectively control the process.

Another significant patent is the "Method and apparatus for real-time monitoring of wafer attributes in a manufacturing process." This invention provides a system for monitoring product attributes during manufacturing. It employs an intelligent system trained to understand the relationship between manufacturing process signatures and product attributes over time. The apparatus can be integrated into manufacturing machinery, allowing processes to continue until the desired state is achieved.

Career Highlights

Throughout his career, Ibbotson has worked with prominent companies such as Lucent Technologies Inc. and AT&T Corp. His experience in these organizations has contributed to his expertise in the field of semiconductor manufacturing.

Collaborations

Ibbotson has collaborated with notable individuals in his field, including Tseng-Chung Lee and Edward Alois Reitman. These collaborations have further enriched his work and innovations in plasma etch processes.

Conclusion

Dale E Ibbotson's contributions to the field of integrated circuit fabrication through his innovative patents demonstrate his commitment to advancing technology in the semiconductor industry. His work continues to influence manufacturing processes and improve efficiency in the field.