Company Filing History:
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Years Active: 1983-1990
Title: Dale E Ibbotson: Innovator in Silicon Nitride Technology
Introduction
Dale E Ibbotson is a notable inventor based in Westfield, NJ (US), recognized for his contributions to the field of semiconductor technology. With a total of 5 patents, Ibbotson has made significant advancements in the production and application of silicon nitride.
Latest Patents
Ibbotson's latest patents include innovative processes and devices for producing silicon nitride. One of his key inventions involves a plasma deposition process that creates silicon nitride regions suitable for applications such as capping layers in integrated circuit fabrication. This process utilizes a combination of gases, including a silicon-containing gas, a nitrogen-containing gas, a fluorine-containing gas, and a hydrogen-containing gas. The resulting silicon nitride exhibits a low density of defect states, providing excellent dielectric properties. Another significant patent focuses on processes that depend on plasma generation using a helical resonator. This method allows for anisotropic plasma etching at relatively low gas pressure, yielding a high flux of ionic species for rapid anisotropic etching. The helical resonator, when used with suitable precursors, is also effective for plasma-induced deposition.
Career Highlights
Throughout his career, Ibbotson has worked with prestigious organizations, including AT&T Bell Laboratories and American Telephone & Telegraph Company. His work at these institutions has contributed to the advancement of telecommunications and semiconductor technologies.
Collaborations
Ibbotson has collaborated with notable colleagues, including Daniel L Flamm and Vincent Michael Donnelly, Jr. Their combined expertise has furthered research and development in their respective fields.
Conclusion
Dale E Ibbotson's innovative work in silicon nitride technology has made a lasting impact on the semiconductor industry. His patents and career achievements reflect his dedication to advancing technology and improving device performance.