Company Filing History:
Years Active: 2017
Title: Daisuki Taniguchi: Innovator in Power MOSFET Manufacturing
Introduction
Daisuki Taniguchi is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of power MOSFET technology. His innovative approach has led to advancements that enhance the efficiency and performance of electronic devices.
Latest Patents
Daisuki Taniguchi holds 1 patent for his invention titled "Manufacturing method of power MOSFET using a hard mask as a CMP stop layer between sequential CMP steps." This patent describes a manufacturing method that employs a hard mask film over a portion of the wafer surface as a polishing stopper between two successive polishing steps. The process involves embedded epitaxial growth performed in a state where a hard mask film for forming trenches is present in at least a scribe region of a wafer. Primary polishing is conducted using the hard mask film as a stopper, followed by secondary polishing after the hard mask film is removed.
Career Highlights
Daisuki Taniguchi is currently associated with Renesas Electronics Corporation, a leading company in the semiconductor industry. His work at Renesas focuses on enhancing manufacturing processes and improving the performance of power MOSFETs. His expertise and innovative mindset have positioned him as a valuable asset to the company.
Collaborations
Daisuki Taniguchi collaborates with Satoshi Eguchi, a fellow innovator in the field. Their combined efforts contribute to the advancement of semiconductor technologies and the development of new manufacturing techniques.
Conclusion
Daisuki Taniguchi's contributions to the field of power MOSFET manufacturing exemplify the impact of innovation in technology. His patent and work at Renesas Electronics Corporation highlight his role as a key figure in the semiconductor industry.