Aichi, Japan

Daisuke Uki

This inventor holds 1 USPTO granted patent. Top assignees: Denso Corporation, Horiba, Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daisuke Uki. Retrieved from https://idiyas.com/inventor/daisuke-uki-0pkvofr8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Daisuke Uki: Innovator in Contaminant Removal Technology

Introduction

Daisuke Uki is a notable inventor based in Aichi, Japan. He has made significant contributions to the field of contaminant removal technology. His innovative approach has led to the development of a unique device aimed at enhancing the efficiency of contaminant removal processes.

Latest Patents

Daisuke Uki holds a patent for a "Contaminant removal device and contaminant removal method." This invention focuses on improving contaminant removal performance, regardless of the surface structure of the object being treated. The device operates by utilizing a gas that is sprayed from a nozzle with a specific design. The aperture ratio of the opposing end portions of the gas outlet is intentionally set smaller than that of the central portion, optimizing the removal process.

Career Highlights

Throughout his career, Daisuke Uki has worked with prominent companies such as Denso Corporation and Horiba, Ltd. His experience in these organizations has contributed to his expertise in developing innovative solutions for contaminant removal.

Collaborations

Daisuke has collaborated with talented individuals in his field, including Takanori Nakamura and Daisaku Sugi. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Daisuke Uki's contributions to contaminant removal technology exemplify his innovative spirit and dedication to improving industrial processes. His patent and collaborations highlight his role as a key figure in this important field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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