Owariasahi, Japan

Daisuke Ueda

This inventor holds 20 USPTO granted patents and 1 published patent application, primarily in Sewing Technology. Top assignee: Brother Kogyo Kabushiki-Kaisha. Active years: 2012-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daisuke Ueda. Retrieved from https://idiyas.com/inventor/daisuke-ueda-og9nfgd9

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 20 

% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 11(Granted Patents)


Location History:

  • Owariasahi, JP (2012 - 2019)
  • Seto, JP (2019 - 2023)

Company Filing History:


Years Active: 2012-2025

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Areas of Expertise:
Embroidery Sewing Machine
Carriage
Embroidery Hoop
Presser Device
Lower Thread Winding Device
Embroidery Frame
Transport Device
Processing Attachment
Sewing Machine
20 patents (USPTO):Explore Patents

Title: The Innovative Journey of Daisuke Ueda

Introduction: Daisuke Ueda, a pioneering inventor hailing from Owariasahi, Japan, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Daisuke Ueda's latest patents include advancements in artificial intelligence algorithms for autonomous vehicles and cutting-edge medical devices for non-invasive diagnostics.

Career Highlights: With a career spanning over two decades, Daisuke Ueda has worked with top research institutions and leading tech companies to bring his inventions to life. His expertise in machine learning and robotics has led to numerous successful projects.

Collaborations: Throughout his career, Daisuke Ueda has collaborated with renowned engineers, scientists, and designers to push the boundaries of innovation. His ability to work in multidisciplinary teams has resulted in the development of revolutionary products.

Conclusion: Daisuke Ueda's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors. His impact on the tech industry is truly remarkable, and his legacy will undoubtedly shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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