Chiba, Japan

Daisuke Tanaka

This inventor holds 1 USPTO granted patent. Top assignee: Sony Corporation. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daisuke Tanaka. Retrieved from https://idiyas.com/inventor/daisuke-tanaka-ky7oy7jq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Daisuke Tanaka: Innovator in Light Irradiation Technology

Introduction

Daisuke Tanaka is a prominent inventor based in Chiba, Japan. He has made significant contributions to the field of light irradiation technology. His innovative work has led to the development of a unique light irradiation apparatus that enhances component mounting processes.

Latest Patents

Daisuke Tanaka holds 1 patent for his invention titled "Light irradiation apparatus, component image pickup apparatus, and component mounting apparatus." This apparatus is designed to irradiate light onto a reflective plate while holding a component securely. The system includes multiple light-emitting devices and a light guide body that directs the emitted light to improve detection efficiency.

Career Highlights

Tanaka is currently employed at Sony Corporation, where he continues to push the boundaries of technology. His work at Sony has allowed him to collaborate with other talented engineers and inventors in the field. His dedication to innovation has made him a valuable asset to the company.

Collaborations

Daisuke Tanaka has worked alongside notable colleagues such as Akira Koshimura and Kazuhito Kunishima. Their combined expertise has fostered a collaborative environment that encourages the development of cutting-edge technologies.

Conclusion

Daisuke Tanaka's contributions to light irradiation technology exemplify the spirit of innovation. His patent and work at Sony Corporation highlight his commitment to advancing technology in meaningful ways.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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