Daisuke Satake

Title: Innovations by Daisuke Satake in Substrate Processing Technology

Introduction

Daisuke Satake, an accomplished inventor based in Miyagi, Japan, has a noteworthy portfolio with three patents to his name. His innovative contributions have significantly impacted the field of substrate processing technology, showcasing his dedication and expertise in engineering.

Latest Patents

Satake's latest patents demonstrate his commitment to advancing technological solutions. One such innovation is the **Placement Stage and Substrate Processing Apparatus**. This apparatus features a wafer placement part equipped with a placement surface and a first through hole. It includes a base that is bonded to the rear surface of the wafer placement part using a first adhesive layer. Notably, the design also incorporates a sleeve within a second through hole, allowing for a detachable assembly, and a sealing member that effectively manages the interaction with adhesive layers. The convex portion extending from the sleeve enhances the functionality of the sealing member, ensuring reliable operation.

Another significant invention is the **Substrate Processing Apparatus and Electrostatic Chuck**. This device comprises a chamber designed for substrate support, which contains at least one gas supply path controlled by a valve. The electrostatic chuck on the substrate support features multiple protrusions and grooved pathways, optimizing gas flow and substrate management during processing. These inventions reflect Satake's innovative spirit and his impact on the technology surrounding semiconductor manufacturing.

Career Highlights

Throughout his career at Tokyo Electron Limited, Daisuke Satake has made pivotal contributions to semiconductor manufacturing technology. His role has allowed him to refine his skills in creating solutions that address contemporary challenges within the industry. The patents he holds exemplify his technical prowess and innovative mindset.

Collaborations

Satake’s work at Tokyo Electron Limited has seen him collaborate with esteemed colleagues such as Kohei Otsuki and Shin Yamaguchi. Their combined efforts contribute to the cutting-edge advancements in substrate processing technologies. This teamwork emphasizes the importance of collaboration in driving innovation.

Conclusion

Daisuke Satake continues to be a vital figure in the realm of substrate processing technology. His patents not only enhance functionality in semiconductor manufacturing but also set the stage for future innovations. With a strong background and collaborative spirit, Satake’s contributions are expected to shape the industry for years to come.