Kokubunji, Japan

Daisuke Sakaue

This inventor holds 1 USPTO granted patent. Top assignee: Rion Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daisuke Sakaue. Retrieved from https://idiyas.com/inventor/daisuke-sakaue-fxd9ksb2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Daisuke Sakaue: Innovator in Particle Counting Technology

Introduction

Daisuke Sakaue is a notable inventor based in Kokubunji, Japan. He has made significant contributions to the field of particle counting technology. His innovative approach has led to the development of a unique particle counter that enhances the accuracy of fluid analysis.

Latest Patents

Daisuke Sakaue holds a patent for a particle counter. This device is designed to count particles contained in a sample fluid flowing through a flow passage by utilizing light to irradiate the flow passage. The particle counter features a multi-flow cell with several flow passages, a path adjuster to modify the optical path of the light based on the selected flow passage, and a light adjuster to regulate the light conditions for the selected flow passage. He has 1 patent to his name.

Career Highlights

Daisuke Sakaue is currently employed at Rion Ltd., a company known for its advancements in measurement technology. His work at Rion Ltd. has allowed him to focus on developing innovative solutions that address the needs of various industries.

Collaborations

Daisuke collaborates with talented coworkers, including Daisuke Shinozaki and Moe Susaki. Their combined expertise fosters a creative environment that drives innovation within their projects.

Conclusion

Daisuke Sakaue's contributions to particle counting technology exemplify his commitment to innovation. His work continues to impact the field positively, showcasing the importance of advancements in measurement technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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