Nagano, Japan

Daisuke Osanai

This inventor holds 1 USPTO granted patent. Top assignee: Seiko Epson Corporation. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daisuke Osanai. Retrieved from https://idiyas.com/inventor/daisuke-osanai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 11.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Daisuke Osanai and Manufacturing Process Management

Introduction

Daisuke Osanai is an inventor associated with Nagano, Japan, and Seiko Epson Corporation. His patent work includes a system designed to help track products as they move through manufacturing processes.

Latest Patents

Osanai is named on one patent, “Process Management Systems and Methods of the Same.” The invention describes a manufacturing process management system in which terminals at different stages scan a barcode attached to a product and record the start of processing. The system stores the product’s processing status in a database and can provide that status to a client PC upon request. This approach helps users identify a product’s current position in a multi-stage manufacturing flow.

Career Highlights

Osanai’s recorded patent activity reflects an interest in manufacturing operations and process visibility. His invention addresses the practical challenge of tracking products across multiple production stages.

Collaborations

Osanai’s named coworkers include fellow inventors Eiichiro Furihata and Yoshito Tazawa. Their shared patent work connects their contributions to manufacturing process management.

Conclusion

Daisuke Osanai’s patent presents a barcode-based method for monitoring product progress through manufacturing, supporting clearer visibility into production status.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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