Abiko, Japan

Daisuke Oikawa

This inventor holds 2 USPTO granted patents. Top assignee: Smc Kabushiki Kaisha. Active years: 2016.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2016

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2 patents (USPTO):Explore Patents

Title: Daisuke Oikawa: Innovator in Fluid Pressure Devices

Introduction

Daisuke Oikawa is a notable inventor based in Abiko, Japan. He has made significant contributions to the field of fluid pressure devices, holding a total of 2 patents. His innovative designs focus on enhancing the functionality and efficiency of filter apparatuses.

Latest Patents

Oikawa's latest patents include a "Case structure for fluid pressure device" and a "Filter apparatus." The case structure patent describes a design where a filter, part of a fluid pressure unit, is equipped with a first body and a case unit connected to the lower portion of the first body. This case unit is constructed from a light-permeable transparent material, allowing for visibility of the internal components. The design facilitates easy installation by engaging projections and retaining walls with support members in the installation hole. Similarly, the filter apparatus patent outlines a comparable structure, emphasizing the importance of the case unit's design in ensuring a secure connection and optimal performance.

Career Highlights

Daisuke Oikawa is currently employed at SMC Corporation, where he continues to innovate in the field of fluid pressure technology. His work has been instrumental in developing advanced solutions that meet the needs of various industries.

Collaborations

Oikawa collaborates with his coworker, Norihide Yamase, to further enhance their research and development efforts in fluid pressure devices.

Conclusion

Daisuke Oikawa's contributions to fluid pressure technology through his patents and work at SMC Corporation highlight his role as a key innovator in this field. His designs not only improve functionality but also pave the way for future advancements in fluid pressure devices.

Profile summary based on public USPTO records.
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