Shiga, Japan

Daisuke Ohtsuka

This inventor holds 1 USPTO granted patent. Top assignee: Murata Manufacturing Co., Ltd.. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daisuke Ohtsuka. Retrieved from https://idiyas.com/inventor/daisuke-ohtsuka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Daisuke Ohtsuka: Innovator in Capacitor Technology

Introduction

Daisuke Ohtsuka is a notable inventor based in Shiga, Japan. He has made significant contributions to the field of capacitor technology, particularly through his innovative designs that enhance performance and reliability.

Latest Patents

Ohtsuka holds a patent for a capacitor array that includes four internal electrodes and internal electrode extraction sections. These sections are designed for electrical conduction with the corresponding internal electrodes and are symmetrically arranged relative to the long-side-direction center of each dielectric sheet. The arrangement allows for a pitch between the internal electrode extraction sections that is smaller than that between the internal electrodes. This design results in a capacitor array that boasts excellent drop shock resistance.

Career Highlights

Daisuke Ohtsuka is associated with Murata Manufacturing Co., Ltd., a leading company in electronic components. His work has contributed to advancements in capacitor technology, making significant impacts in various applications.

Collaborations

Ohtsuka has collaborated with notable colleagues such as Masaaki Taniguchi and Yoshio Kawaguchi. Their combined expertise has fostered innovation and development in their respective fields.

Conclusion

Daisuke Ohtsuka's contributions to capacitor technology exemplify the importance of innovation in the electronics industry. His patent reflects a commitment to enhancing product performance and reliability.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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