Joetsu, Japan

Daisuke Iwai


 

Average Co-Inventor Count = 4.4

ph-index = 4

Forward Citations = 34(Granted Patents)


Location History:

  • Niigata-ken, JP (2006)
  • Joetsu, JP (1995 - 2019)
  • Niigata, JP (2019)

Company Filing History:


Years Active: 1995-2019

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10 patents (USPTO):Explore Patents

Title: Daisuke Iwai: Innovator in Defect Classification and Photomask Manufacturing

Introduction

Daisuke Iwai is a prominent inventor based in Joetsu, Japan, known for his innovative contributions to the fields of defect classification and photomask manufacturing. With a total of 10 patents to his name, he continues to push the boundaries of technology in his industry.

Latest Patents

Iwai's latest patents include a defect classification method, a method of sorting photomask blanks, and a method of manufacturing mask blanks. The defect classification method he developed utilizes two types of images output from a defect inspection device. The first inspection image is generated from a luminance signal, while the second image highlights a luminance distribution emphasizing defective sections. This dual-image technique allows for more accurate discrimination of defects in shape and enhances the efficiency of defect identification.

His methods for inspecting photomask blanks involve irradiating a surface region with inspection light, collecting the reflected light, and constructing a magnified image for analysis. By extracting feature parameters from this image, the method effectively identifies defects such as bumps or pits, resulting in the production of photomask blanks with high reliability and lower costs.

Career Highlights

Iwai is currently associated with Shin-Etsu Chemical Co., Ltd., where he continues to innovate within the semiconductor industry. His work is critical for advancing manufacturing techniques, especially in photomask technology, ensuring quality and efficiency in production processes.

Collaborations

Throughout his career, Iwai has collaborated with notable coworkers such as Tsuneo Terasawa and Hiroshi Fukuda. Their collaborative efforts have contributed significantly to enhancing the performance and reliability of photomask manufacturing processes.

Conclusion

Daisuke Iwai's dedication to innovation and excellence in defect inspection and photomask manufacturing underscores his status as a leading inventor in his field. With a continuous pursuit of technological advancements, Iwai's contributions are set to redefine industry standards and improve production reliability. His patents not only reflect his inventive spirit but also promise to foster further advancements in manufacturing technology.

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