Tokyo, Japan

Daisuke Hirama

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Hartalega Sdn Bhd, Midori Anzen Co., Ltd.. Active years: 2017.


% Patents Active = 100.0

 

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Daisuke Hirama: Innovator in Glove Technology

Introduction

Daisuke Hirama is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of glove technology, particularly in enhancing the detection capabilities of gloves using metal detectors. His innovative approach has led to the development of a unique glove that incorporates magnetic particles.

Latest Patents

Hirama holds a patent for a glove and its production process. This invention aims to reduce the minimum detectable volume of a glove when using a metal detector. The glove is made from a rubber or resin film that contains magnetic particles, with a concentration ranging from 0.2 to less than 40 mass % relative to the entire film. The magnetic particles consist of secondary particles formed by the agglomeration of primary particles.

Career Highlights

Throughout his career, Daisuke Hirama has worked with several companies, including Midori Anzen Co., Ltd. and Hartalega Sdn Bhd. His experience in these organizations has contributed to his expertise in glove manufacturing and innovation.

Collaborations

Hirama has collaborated with notable individuals in his field, including Norihide Enomoto and Taichi Ogawa. These partnerships have likely fostered a creative environment that encourages the development of new ideas and technologies.

Conclusion

Daisuke Hirama's contributions to glove technology demonstrate his innovative spirit and commitment to enhancing safety and functionality in everyday products. His patent reflects a significant advancement in the industry, showcasing the potential for further developments in glove design and production.

Profile summary based on public USPTO records.
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