Nagoya, Japan

Daisuke Endo

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Fuji Corporation. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daisuke Endo. Retrieved from https://idiyas.com/inventor/daisuke-endo-6scsshzk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Daisuke Endo: Innovator in Mounting Technology

Introduction

Daisuke Endo is a notable inventor based in Nagoya, Japan. He has made significant contributions to the field of mounting technology, particularly through his innovative patent. His work is recognized for enhancing the efficiency and accuracy of component placement in various applications.

Latest Patents

Daisuke Endo holds a patent for a "Mounting apparatus and mounting method." This invention involves a mounting apparatus that executes a first mode, capturing an image of fiducial marks when a tray member is moved to a collection position. It obtains a correction value to adjust the collection position of a component based on the captured image. Additionally, the apparatus operates in a second mode, capturing images more frequently to refine the correction value, thereby improving the precision of component placement.

Career Highlights

Daisuke Endo is currently employed at Fuji Corporation, where he continues to develop innovative solutions in mounting technology. His expertise and dedication to his work have positioned him as a key figure in his field.

Collaborations

Daisuke collaborates with talented coworkers, including Yusuke Tsuchiya and Shigenori Sengoku. Their combined efforts contribute to the advancement of technology at Fuji Corporation.

Conclusion

Daisuke Endo's contributions to mounting technology through his patent demonstrate his innovative spirit and commitment to improving industry standards. His work continues to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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