Niigata, Japan

Daisuke Asanuma


Average Co-Inventor Count = 2.9

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Niigata, JP (2008 - 2016)
  • Ichihara, JP (2016)

Company Filing History:


Years Active: 2008-2016

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4 patents (USPTO):Explore Patents

Title: Daisuke Asanuma: Innovator in Organosilicon Compounds

Introduction

Daisuke Asanuma is a notable inventor based in Niigata, Japan. He has made significant contributions to the field of organosilicon compounds, holding a total of 4 patents. His work focuses on developing novel materials with improved physical properties, particularly in the realm of organic thin films.

Latest Patents

Asanuma's latest patents include innovations related to organosilicon compounds and thin film forming compositions. One of his key inventions is an organosilicon compound represented by the formula (I) R—(CH)—SiX(I), where R is an alkoxy group with 1 to 3 carbon atoms or a phenyl group, X is a hydroxyl or hydrolyzable group, and n is an integer from 17 to 24. This invention aims to provide a compound that can form a novel organic thin film with enhanced physical properties. The process involves mixing the organosilicon compound with a compatible compound and water in an organic solvent to create a thin film forming solution, which is then applied to a substrate.

Career Highlights

Throughout his career, Daisuke Asanuma has worked with reputable companies such as Nippon Soda Co., Ltd. and Asubio Pharma Co. Ltd. His experience in these organizations has contributed to his expertise in the development of innovative materials.

Collaborations

Asanuma has collaborated with notable colleagues, including Tomoya Hidaka and Toshiaki Takahashi. These partnerships have likely enriched his research and development efforts in the field of organosilicon compounds.

Conclusion

Daisuke Asanuma's contributions to the field of organosilicon compounds and organic thin films highlight his innovative spirit and dedication to advancing material science. His patents reflect a commitment to improving physical properties in practical applications.

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