Aichi, Japan

Daisaku Sugi

This inventor holds 1 USPTO granted patent. Top assignees: Denso Corporation, Horiba, Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daisaku Sugi. Retrieved from https://idiyas.com/inventor/daisaku-sugi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Daisaku Sugi: Innovator in Contaminant Removal Technology

Introduction

Daisaku Sugi is a notable inventor based in Aichi, Japan. He has made significant contributions to the field of contaminant removal technology. His innovative approach has led to the development of a unique device aimed at enhancing the efficiency of contaminant removal processes.

Latest Patents

Daisaku Sugi holds a patent for a "Contaminant removal device and contaminant removal method." This invention focuses on improving contaminant removal performance, regardless of the surface structure of an object. The device operates by spraying gas from a nozzle, where the aperture ratio of the opposing end portions of the gas outlet is smaller than that of the central portion. This design allows for more effective removal of contaminants attached to various surfaces.

Career Highlights

Throughout his career, Daisaku Sugi has worked with prominent companies such as Denso Corporation and Horiba, Ltd. His experience in these organizations has contributed to his expertise in developing advanced technologies for contaminant removal.

Collaborations

Daisaku Sugi has collaborated with talented individuals in his field, including Takanori Nakamura and Daisuke Uki. These partnerships have fostered innovation and have played a crucial role in the advancement of his projects.

Conclusion

Daisaku Sugi's work in contaminant removal technology exemplifies the impact of innovative thinking in addressing practical challenges. His patent and collaborations highlight his commitment to improving efficiency in this important area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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