Kyoto, Japan

Daiki Uehara

USPTO Granted Patents = 2 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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2 patents (USPTO):Explore Patents

Title: Daiki Uehara: Innovator in Substrate Processing Technology

Introduction

Daiki Uehara is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing technology, holding 2 patents that showcase his innovative approach to enhancing processing apparatuses.

Latest Patents

Uehara's latest patents include a substrate processing apparatus designed to process a surface of a substrate using a processing fluid in a supercritical state. This invention protects the substrate from pressure fluctuations caused by the partial vaporization of the processing fluid within the flow path. The apparatus features a chamber housing with a processing space for the substrate and a flow path that guides the processing fluid to the processing space. Additionally, it includes a fluid supply part that pressure-feeds the processing fluid, incorporating multiple bent parts to change the flow direction effectively.

Another notable patent is also a substrate processing apparatus that processes a surface of a substrate. This design includes a support tray with a concave part for housing the substrate and a storage container with a cavity for storing the support tray in a horizontal posture. The fluid supply part in this apparatus supplies the processing fluid to the cavity, ensuring efficient processing.

Career Highlights

Uehara is currently employed at Screen Holdings Co., Ltd., where he continues to develop innovative technologies in substrate processing. His work has significantly impacted the efficiency and effectiveness of processing apparatuses in various applications.

Collaborations

Uehara collaborates with notable coworkers, including Noritake Sumi and Masanobu Sato, who contribute to the innovative environment at Screen Holdings Co., Ltd.

Conclusion

Daiki Uehara's contributions to substrate processing technology reflect his dedication to innovation and excellence. His patents demonstrate a commitment to advancing the field and improving processing techniques.

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