Yokkaichi, Japan

Daiki Hatayama

This inventor holds 1 USPTO granted patent. Top assignee: Sumitomo Wiring Systems, Limited. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daiki Hatayama. Retrieved from https://idiyas.com/inventor/daiki-hatayama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Daiki Hatayama: Innovator in Connector Technology

Introduction

Daiki Hatayama is a notable inventor based in Yokkaichi, Japan. He has made significant contributions to the field of connector technology. His innovative designs have led to the development of a unique connector that enhances functionality and reliability.

Latest Patents

Daiki Hatayama holds 1 patent for a connector. This connector features a front wall designed to face the front end of a housing. It includes a front retainer with detecting portions that fit into deformation spaces in an assembled state. Additionally, it has restrictions that limit relative displacements of the housing and the front retainer in a direction that crosses the assembling direction.

Career Highlights

Daiki Hatayama is currently employed at Sumitomo Wiring Systems, Limited. His work at this esteemed company has allowed him to focus on advancing connector technology. His dedication to innovation has positioned him as a key player in his field.

Collaborations

Daiki collaborates with Kazuaki Takeda, who is also involved in the development of connector technologies. Their partnership has fostered a creative environment that encourages the exchange of ideas and expertise.

Conclusion

Daiki Hatayama's contributions to connector technology exemplify his innovative spirit and commitment to excellence. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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