Tokyo, Japan

Daiki Hasebe

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Ricoh Company, Ltd.. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daiki Hasebe. Retrieved from https://idiyas.com/inventor/daiki-hasebe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Daiki Hasebe: Innovator in Ink Technology

Introduction

Daiki Hasebe is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of ink technology, particularly in the development of image forming apparatuses and methods. His innovative approach has led to the creation of a unique ink formulation that enhances image quality.

Latest Patents

Hasebe holds a patent for an ink that contains water, a coloring material, a resin, and an organic solvent. This ink is designed such that the dried layer exhibits a surface free energy γ with a polar component γ ranging from 3.5 to 20 J/m² at 25 degrees Celsius. This innovation is crucial for improving the performance of image forming devices.

Career Highlights

Daiki Hasebe is currently employed at Ricoh Company, Ltd., where he continues to push the boundaries of ink technology. His work has been instrumental in advancing the capabilities of printing and imaging solutions.

Collaborations

Hasebe collaborates with talented colleagues, including Mayumi Yoshihara and Michihiko Namba. Together, they contribute to the innovative projects at Ricoh, enhancing the company's reputation in the industry.

Conclusion

Daiki Hasebe's contributions to ink technology exemplify the spirit of innovation. His patent and ongoing work at Ricoh Company, Ltd. highlight his commitment to advancing imaging solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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