Kanagawa, Japan

Daigo Hoshino

This inventor holds 6 USPTO granted patents and 1 published patent application. Top assignees: Oki Electric Industry Co., Ltd., Oki Semiconductor Co., Ltd.. Active years: 2005-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daigo Hoshino. Retrieved from https://idiyas.com/inventor/daigo-hoshino

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6 

% Patents Active = 16.7

Average Co-Inventor Count = 1.5

ph-index = 3

Forward Citations = 13(Granted Patents)


Location History:

  • Kanagawa, JP (2005)
  • Tokyo, JP (2005 - 2006)
  • Sendai, JP (2007)
  • Miyagi, JP (2010)

Company Filing History:


Years Active: 2005-2010

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6 patents (USPTO):Explore Patents

Title: Daigo Hoshino: Innovator in Optical Technologies

Introduction

Daigo Hoshino is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of optical technologies, holding a total of 6 patents. His innovative work focuses on improving the functionality and efficiency of optical devices.

Latest Patents

Hoshino's latest patents include a self-cleaning method for aligners and a phase difference specifying method. The self-cleaning method involves a reflecting plate with a convex lens portion that is set in an original plate holder. Exposure light rays are irradiated from a light source, and the lens portion is coated with a reflective film. This setup allows the light rays to be reflected, diffused, and emitted onto the surface of a condenser lens, effectively breaking down and removing contaminants. The method also ensures that contaminants in areas other than the normal exposure path are cleaned.

The phase difference specifying method features a phase shift mask with first and second mask patterns. The first mask pattern acts as a backing film that enables the formation of a first optical image on a substrate. This image creates a resist pattern with a width that varies based on the distance between the mask and the substrate. The second mask pattern, a semi-transmissive film, allows for the formation of a second optical image, which also results in a resist pattern with a width that changes depending on specific parameters. The duty ratio of the second mask is carefully set to ensure that the width variations of both optical images are synchronized.

Career Highlights

Throughout his career, Hoshino has worked with notable companies such as Oki Electric Industry Co., Ltd. and Oki Semiconductor Co., Ltd. His experience in these organizations has contributed to his expertise in optical technologies and innovation.

Collaborations

Hoshino has collaborated with esteemed colleagues, including Ryoichi Aoyama and Toshio Onodera. These partnerships have further enriched his work and expanded the impact of his inventions.

Conclusion

Daigo Hoshino is a distinguished inventor whose contributions to optical technologies have paved the way for advancements in the field. His innovative patents reflect his commitment to enhancing the efficiency and functionality of optical devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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