Dai N Lee

Title: Dai N Lee - Innovator in Semiconductor Manufacturing

Introduction

Dai N Lee is a prominent inventor based in Fremont, CA, specializing in semiconductor manufacturing processes. He has made significant contributions to the field, particularly through his innovative patent that addresses challenges in etching organic antireflective coatings.

Latest Patents

Dai N Lee holds a patent titled "Method of plasma etching organic antireflective coating." This invention describes a semiconductor manufacturing process wherein an organic antireflective coating is etched using an O-free sulfur-containing gas. This method provides selectivity concerning an underlying layer and minimizes the lateral etch rate of an overlying photoresist, thereby maintaining critical dimensions defined by the photoresist. The etchant gas can include SO and a carrier gas such as Ar or He, with optional additions of other gases like HBr. This process is particularly useful for etching 0.25 micron and smaller contact or via openings in forming structures such as damascene structures. Dai N Lee has 1 patent to his name.

Career Highlights

Dai N Lee is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work focuses on advancing technologies that enhance the efficiency and precision of semiconductor manufacturing processes.

Collaborations

Dai N Lee has collaborated with notable colleagues, including Tuqiang Q Ni and Weinan Jiang, contributing to various projects that push the boundaries of semiconductor technology.

Conclusion

Dai N Lee's innovative work in semiconductor manufacturing, particularly his patented method for etching organic antireflective coatings, showcases his expertise and commitment to advancing technology in this critical field. His contributions continue to influence the industry and pave the way for future innovations.