Ueda, Japan

Dai Mochizuki



Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021-2023

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2 patents (USPTO):Explore Patents

Title: Dai Mochizuki: Innovator in Electrocatalysis

Introduction

Dai Mochizuki is a prominent inventor based in Ueda, Japan. He has made significant contributions to the field of electrocatalysis, holding 2 patents that showcase his innovative approach to materials science.

Latest Patents

Mochizuki's latest patents include an electrocatalyst that features carbon and a nanosheet supported on the carbon. This nanosheet comprises a metal ruthenium nanosheet, with a platinum atomic layer formed on its entire surface. Notably, the metal ruthenium nanosheet is a monoatomic layer, while the platinum atomic layer can be either a monoatomic layer or a laminated body. Another patent describes a core-shell structure type nanosheet, which includes a metal ruthenium nanosheet and a platinum atomic layer on its surface. This electrocatalyst also incorporates carbon, with the core-shell structure nanosheet supported on it. The method for manufacturing this electrocatalyst involves applying a ruthenium oxide nanosheet colloid on carbon to create a carbon-supported ruthenium oxide nanosheet. This nanosheet is then reduced to obtain a carbon-supported ruthenium metal nanosheet, followed by the addition of a platinum atomic layer on its surface.

Career Highlights

Dai Mochizuki has worked with notable institutions such as Shinshu University and Ishifuku Metal Industry Co., Ltd. His work has significantly advanced the understanding and application of electrocatalysts in various industries.

Collaborations

Mochizuki has collaborated with esteemed colleagues, including Wataru Sugimoto and Yusuke Ayato, further enhancing the impact of his research and innovations.

Conclusion

Dai Mochizuki is a key figure in the field of electrocatalysis, with a focus on innovative materials that have the potential to revolutionize energy conversion technologies. His contributions continue to influence the scientific community and industry practices.

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