Komae, Japan

Dai Kawarai

This inventor holds 1 USPTO granted patent. Top assignees: Hitachi Engineering Services Co., Ltd., Hitachi, Ltd., Matrix Gmbh. Active years: 2012.


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: The Innovations of Dai Kawarai

Introduction

Dai Kawarai is a notable inventor based in Komae, Japan. He has made significant contributions to the field of technology, particularly in the area of RFID systems. His innovative work has led to the development of a unique tag detecting system that enhances the management of entrances and exits.

Latest Patents

Kawarai holds a patent for a "Tag detecting system, moving object detecting method, and entrance/exit management system." This system is designed to detect the movement of individuals or objects equipped with RFID tags. The technology restricts the detection area of the RFID tag to a narrow zone, allowing for precise identification. Additionally, the moving object detecting method is capable of identifying instances of piggybacking, thereby preventing unauthorized entry even when multiple individuals pass through an entrance or exit gate simultaneously. He has 1 patent to his name.

Career Highlights

Throughout his career, Kawarai has worked with prominent companies such as Hitachi, Ltd. and Hitachi Engineering Services Co., Ltd. His experience in these organizations has contributed to his expertise in developing advanced technological solutions.

Collaborations

Kawarai has collaborated with notable colleagues, including Masahiro Takeshima and Kazuo Tamura. Their combined efforts have furthered the development of innovative technologies in their respective fields.

Conclusion

Dai Kawarai's contributions to RFID technology and entrance/exit management systems highlight his role as a significant inventor in the industry. His innovative solutions continue to impact the way we manage access and movement in various environments.

Profile summary based on public USPTO records.
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