Shenzhen, China

Dahua Zhang

This inventor holds 1 USPTO granted patent. Top assignee: Hamedata Technology Co., Limited. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dahua Zhang. Retrieved from https://idiyas.com/inventor/dahua-zhang-igvhiap1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Dahua Zhang

Introduction

Dahua Zhang is a prominent inventor based in Shenzhen, China. He has made significant contributions to the field of technology, particularly with his innovative designs and solutions. His work is characterized by a commitment to advancing technology and improving user experiences.

Latest Patents

Dahua Zhang holds a patent for an outdoor power supply. This invention showcases his ability to address practical needs in outdoor settings, providing reliable power solutions for various applications. His patent portfolio includes 1 patent, reflecting his focused approach to innovation.

Career Highlights

Dahua Zhang is currently employed at Hamedata Technology Co., Limited. His role at the company allows him to leverage his inventive skills and contribute to the development of cutting-edge technologies. His work has positioned him as a valuable asset in the tech industry.

Collaborations

Dahua has collaborated with talented individuals such as Changjun Yang and Pu Su. These partnerships have fostered a creative environment that encourages the exchange of ideas and enhances the innovation process.

Conclusion

Dahua Zhang exemplifies the spirit of innovation through his work and contributions to technology. His dedication to creating practical solutions is evident in his patent for an outdoor power supply. As he continues to collaborate with others in the field, his impact on the industry is likely to grow.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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