Beuren, Germany

Dagmar Arnold

This inventor holds 1 USPTO granted patent. Top assignee: Hermann Wangner Gmbh & Co.. Active years: 1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dagmar Arnold. Retrieved from https://idiyas.com/inventor/dagmar-arnold

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 65(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: Dagmar Arnold - Innovator in Papermaking Technology

Introduction

Dagmar Arnold is a notable inventor based in Beuren, Germany. She has made significant contributions to the field of papermaking technology. Her innovative approach has led to the development of a unique double-layer papermaking fabric.

Latest Patents

Dagmar Arnold holds a patent for a double-layer papermaking fabric designed for the sheet-forming section of a papermaking machine. This fabric consists of an upper layer of transverse threads and a lower layer of transverse threads that are interwoven with a single system of longitudinal threads. The design features pairs of successive transverse threads in the lower layer, with the lowest points of the thread floats aligned in a specific manner to enhance functionality.

Career Highlights

Arnold is currently associated with Hermann Wangner GmbH & Co., where she continues to innovate in her field. Her work has been instrumental in advancing the technology used in papermaking processes.

Collaborations

Dagmar collaborates with Georg Borel, who is also a key figure in her professional environment. Together, they contribute to the ongoing development of innovative solutions in the industry.

Conclusion

Dagmar Arnold's contributions to papermaking technology exemplify her dedication to innovation and excellence. Her patent and ongoing work continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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