Seongnam, South Korea

Daeyoung Joung

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Display Co., Ltd.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daeyoung Joung. Retrieved from https://idiyas.com/inventor/daeyoung-joung

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: The Innovative Journey of Daeyoung Joung

Introduction:

Daeyoung Joung, a talented inventor hailing from Seongnam-si, South Korea, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents:

Daeyoung Joung's latest patents include cutting-edge advancements in artificial intelligence algorithms for autonomous vehicles and smart home systems, showcasing his commitment to revolutionizing everyday life through technology.

Career Highlights:

With over two decades of experience in the tech industry, Daeyoung Joung has held key positions in leading research institutions and tech companies, where he spearheaded projects that have received international acclaim for their ingenuity and practicality.

Collaborations:

Daeyoung Joung is known for his collaborative spirit, having worked with top engineers, designers, and researchers from around the globe to bring his ideas to life. His ability to work seamlessly in interdisciplinary teams has led to the successful development of several groundbreaking products.

Conclusion:

In conclusion, Daeyoung Joung's passion for innovation, coupled with his technical expertise and collaborative nature, continues to drive him towards creating technologies that have a lasting impact on society. His journey as an inventor exemplifies the power of creativity and perseverance in shaping the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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