Suwon, South Korea

Daeun Jeong

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daeun Jeong. Retrieved from https://idiyas.com/inventor/daeun-jeong

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Daeun Jeong: Innovator in NFT-Based Software

Introduction

Daeun Jeong is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of technology, particularly in the realm of non-fungible tokens (NFTs). His innovative approach to software development has garnered attention in the tech community.

Latest Patents

Daeun Jeong holds a patent for a "Method and device for NFT-based software." This invention outlines a method of running NFT-based software on a device. The process includes executing the software in response to an execution request, loading NFT metadata that contains identification information about the software and its owner, and outputting engraving data based on events occurring during the software's operation. He has 1 patent to his name.

Career Highlights

Daeun Jeong is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His work at Samsung has allowed him to explore and develop cutting-edge technologies that push the boundaries of software applications.

Collaborations

Daeun has collaborated with talented coworkers, including Bumhan Kim and Eunbi Kim, who contribute to the innovative environment at Samsung. Their teamwork fosters creativity and drives the development of groundbreaking technologies.

Conclusion

Daeun Jeong's contributions to NFT-based software exemplify the innovative spirit of modern technology. His work not only enhances the functionality of software applications but also paves the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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