Seoul, South Korea

Daesoo Park

This inventor holds 1 USPTO granted patent. Top assignees: Samsung E&A Co., Ltd., Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daesoo Park. Retrieved from https://idiyas.com/inventor/daesoo-park-px59z93u

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Daesoo Park: Wastewater Treatment Innovation.

Introduction

Daesoo Park is an inventor based in Seoul, South Korea. His patent work addresses wastewater treatment, with a focus on removing fluorine and treating ammoniacal nitrogen through a sequence of flocculation, sedimentation, and nitrification processes.

Latest Patents

Park is associated with 1 patent: “Apparatus and Method for Treating Waste Water.” The invention describes a multistage system that uses three flocculation tanks and successive sedimentation stages to separate treated water from sludge. Flocculants and carbon dioxide help coagulate fluorine and form flocculated material. The process then uses a nitrification tank, where carbonate supplied through the carbon dioxide provides alkalinity and nitrifying microorganisms oxidize ammoniacal nitrogen. A final sedimentation tank separates the resulting outflow into sludge and supernatant water.

Career Highlights

Park’s listed company affiliations include Samsung Electronics Ltd. and Samsung E&A Co., Ltd. His patent reflects an engineering approach that combines chemical treatment and biological processing to address wastewater contaminants.

Collaborations

Park’s listed coworkers include Jongkeun Yi and Jehun Kim. Their names are associated with his professional network.

Conclusion

Daesoo Park’s wastewater-treatment patent presents a staged approach to fluorine removal and nitrogen treatment, combining flocculation, sedimentation, and nitrification.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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