Suwon-si, Gyeonggi-do, South Korea

Daekeun Park

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daekeun Park. Retrieved from https://idiyas.com/inventor/daekeun-park-vallt568

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Daekeun Park: Innovator in Display Technology

Introduction

Daekeun Park is a notable inventor based in Suwon-si, Gyeonggi-do, South Korea. He has made significant contributions to the field of display technology, particularly through his innovative patent work. His expertise and creativity have positioned him as a valuable asset in the tech industry.

Latest Patents

Daekeun Park holds a patent titled "Display Adjusting Viewing Angle and Electronic Device Including the Same." This invention addresses the challenges associated with viewing angles in display technology, enhancing user experience and device functionality. His work in this area demonstrates his commitment to advancing electronic device design.

Career Highlights

Currently, Daekeun Park is employed at Samsung Electronics Ltd., a leading global technology company. His role at Samsung allows him to collaborate with some of the brightest minds in the industry, contributing to groundbreaking advancements in electronics and display technology.

Collaborations

Daekeun Park has worked alongside Keehyon Park, a fellow innovator at Samsung. Their collaboration reflects the synergy and teamwork that often lead to successful innovations in technology.

Conclusion

Daekeun Park's contributions to display technology through his patent and work at Samsung Electronics Ltd. highlight his role as a key innovator in the field. His dedication to improving electronic devices continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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