Daejeon, South Korea

Daeheon Lee

This inventor holds 1 USPTO granted patent. Top assignee: Electronics and Telecommunications Research Institute. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daeheon Lee. Retrieved from https://idiyas.com/inventor/daeheon-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Daeheon Lee - Innovator in EMP Protection Technology.

Introduction

Daeheon Lee is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of electromagnetic pulse (EMP) protection technology. His innovative approach has led to the development of a unique product that addresses critical needs in this area.

Latest Patents

Daeheon Lee holds a patent for a "Lightweight and low-cost EMP protection rack." This invention features a design that includes a front door, a rear door, and outer walls that create a protective enclosure. The rack is designed to be lightweight and cost-effective, making it accessible for various applications. Notably, at least one of the doors is implemented as a roller blind with a shielding member, enhancing its functionality.

Career Highlights

Daeheon Lee is affiliated with the Electronics and Telecommunications Research Institute, where he continues to work on innovative solutions in technology. His expertise in EMP protection has positioned him as a valuable asset in his field.

Collaborations

Daeheon collaborates with talented colleagues, including Kibaek Kim and Minseok Yoon. Their combined efforts contribute to advancing research and development in their respective areas of expertise.

Conclusion

Daeheon Lee's contributions to EMP protection technology exemplify the spirit of innovation. His work not only addresses current technological challenges but also paves the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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