Company Filing History:
Years Active: 2012-2021
Title: Daehee Weon: Innovator in Device Manufacturing
Introduction
Daehee Weon is a prominent inventor based in Cupertino, CA (US). He has made significant contributions to the field of device manufacturing, holding a total of 4 patents. His innovative work focuses on enhancing manufacturing processes through advanced etching techniques.
Latest Patents
One of Daehee Weon's latest patents is titled "High lateral to vertical ratio etch process for device manufacturing." This patent describes a method where a layer stack over a substrate is etched using a photoresist pattern deposited on the layer stack as a first mask. The photoresist pattern is in-situ cured using plasma, allowing for modifications to the pattern through curing. In one embodiment, silicon by-products are formed on the photoresist pattern from the plasma. In another embodiment, carbon from the plasma is embedded into the photoresist pattern. Additionally, the plasma produces ultraviolet light to cure the photoresist pattern, which is then slimmed. The layer stack is subsequently etched using the slimmed photoresist pattern as a second mask.
Career Highlights
Daehee Weon is currently employed at Applied Materials, Inc., where he continues to develop innovative solutions for device manufacturing. His expertise in etching processes has positioned him as a key figure in the industry.
Collaborations
Throughout his career, Daehee has collaborated with notable colleagues, including Kyeong Tae Lee and Sang Wook Kim. These collaborations have further enhanced the impact of his work in the field.
Conclusion
Daehee Weon is a distinguished inventor whose contributions to device manufacturing are noteworthy. His innovative patents and collaborations reflect his commitment to advancing technology in this critical area.