This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Samsung Electronics Ltd.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Daegyu Lim - Innovator in Plasma Deposition Technology
Introduction
Daegyu Lim is an inventor based in Suwon-si, South Korea. He is known for his contributions to the field of plasma deposition technology. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.
Latest Patent Applications
1. **Plasma Deposition Apparatus and Plasma Deposition Method** - This application describes a plasma deposition apparatus that includes a process chamber, a substrate stage with an electrostatic chuck, a lower temperature maintenance portion, and a lower electrode. The electrostatic chuck is designed to hold a substrate using an electrostatic adsorption force, while the low temperature maintaining portion cools the substrate. The apparatus also features an exhaust portion for gas removal, an upper electrode facing the lower electrode, a gas supply portion for reaction gas, a first power supply for plasma generation, and a second power supply to control ion energy.
2. **Radiation Shield and Substrate Processing Apparatus Including the Same** - This application details a radiation shield that consists of a shield plate with a first portion, a second portion, and multiple pin holes. The first portion contains several through holes, while the second portion lacks these through holes, enhancing the functionality of the shield in substrate processing.
Conclusion
Daegyu Lim's work in plasma deposition technology showcases his innovative spirit and potential for future contributions to the field. His latest patent applications reflect a commitment to advancing technology in this area.