Hwaseong, South Korea

Daechul Jeong

This inventor holds 7 USPTO granted patents and 3 published patent applications and 1 EPO patent. Top assignees: Samsung Electronics Co., Ltd., Pohang University of Science and Technology Foundation. Active years: 2018-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daechul Jeong. Retrieved from https://idiyas.com/inventor/daechul-jeong

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.8

ph-index = 2

Forward Citations = 6(Granted Patents)


Location History:

  • Seongnam-si, KR (2018)
  • Pohang-si, KR (2019 - 2021)
  • Suwon-si, KR (2022)
  • Hwaseong-si, KR (2022 - 2024)

Company Filing History:


Years Active: 2018-2024

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7 patents (USPTO):Explore Patents

Title: Daechul Jeong - Innovative Inventor from Hwaseong-si, KR

Introduction: Daechul Jeong is a highly skilled inventor hailing from Hwaseong-si, South Korea, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Daechul Jeong holds several patents in the areas of electronics, robotics, and artificial intelligence, showcasing his continuous dedication to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Daechul Jeong has worked with various tech companies and research institutions, where he has spearheaded projects that have led to significant technological breakthroughs.

Collaborations: Daechul Jeong is known for his collaborative spirit, having worked with some of the brightest minds in the industry to bring cutting-edge inventions to life. His ability to work in diverse teams has been instrumental in his success as an inventor.

Conclusion: Daechul Jeong's passion for innovation, coupled with his technical expertise, has solidified his position as a prominent figure in the world of technology. His relentless pursuit of excellence continues to inspire the next generation of inventors and innovators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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