Suwon, South Korea

Dae Shik Kang

This inventor holds 1 USPTO granted patent. Top assignees: Ajou University Industry-Academic Cooperation Foundation, Sungkyunkwan University. Active years: 2020.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Dae Shik Kang: Innovator in Crack Sensor Technology

Introduction

Dae Shik Kang is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of sensor technology, particularly with his innovative approach to crack detection and healing.

Latest Patents

One of his key patents is titled "Crack sensor including polymer for healing cracks and electronic device including the same." This invention provides a crack sensor that incorporates a polymer capable of healing cracks. The sensor consists of a substrate and a conductive layer that contains cracks. The polymer layer, which can be positioned between the substrate and the conductive layer or on top of the conductive layer, exerts a restoring force that suppresses the growth of cracks or restores them. This innovative technology has the potential to enhance the durability and longevity of electronic devices.

Career Highlights

Dae Shik Kang has worked at prestigious institutions such as Sungkyunkwan University and the Ajou University Industry-Academic Cooperation Foundation. His work in these organizations has allowed him to advance his research and contribute to the academic community.

Collaborations

He has collaborated with notable colleagues, including Tae Il Kim and Byeong Hak Park, to further his research and development efforts in sensor technology.

Conclusion

Dae Shik Kang's innovative work in crack sensor technology showcases his commitment to advancing the field. His contributions have the potential to significantly impact the durability of electronic devices, making him a noteworthy figure in the realm of inventions.

Profile summary based on public USPTO records.
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