Hwaseong, South Korea

Dae-Man Seo

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dae-Man Seo. Retrieved from https://idiyas.com/inventor/dae-man-seo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Dae-Man Seo: Innovator in Heat Treatment Technology

Introduction

Dae-Man Seo is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of heat treatment technology. His innovative approach has led to the development of advanced equipment that enhances the efficiency and precision of heat treatment processes.

Latest Patents

Dae-Man Seo holds a patent for "Heat treatment equipment and method of driving the same." This invention includes a process tube with an aperture, a sealing unit for opening or closing the aperture, and a pressure sensor that measures sealing pressure. The design allows for precise sealing of the process tube based on the sealing pressure, ensuring optimal performance during heat treatment.

Career Highlights

Dae-Man Seo is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of innovation in technology. His work has been instrumental in developing solutions that meet the demands of modern manufacturing processes.

Collaborations

Dae-Man Seo has collaborated with talented coworkers, including Jang-Hyeok Lee and Dae-Woo Kim. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Dae-Man Seo's contributions to heat treatment technology exemplify the spirit of innovation. His patent and ongoing work at Samsung Electronics Co., Ltd. highlight his commitment to advancing the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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