This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Dae Kun Ahn: Image Sensor Inventor
Introduction
Dae Kun Ahn is an inventor based in Seoul, South Korea, and is associated with Samsung Electronics Ltd. His patent work includes an image sensor design that integrates pixel isolation and capacitor structures within a semiconductor substrate.
Latest Patents
Ahn is credited with 1 patent. His patent, “Image Sensor,” describes a substrate containing multiple unit pixels, each with a photoelectric conversion element. A lattice-shaped trench isolates the pixels, while capacitor structures extend along the trench sidewalls. Each structure includes first and second electrodes separated by a dielectric layer. A capacitor isolation pattern at the lattice points separates the capacitor structures.
Career Highlights
Ahn’s documented patent contribution focuses on image sensor architecture, combining pixel isolation with integrated capacitor structures. The patent is associated with Samsung Electronics Ltd.
Collaborations
Ahn’s listed coworkers include Hyuk Soon Choi and Sang-Su Park.
Conclusion
Dae Kun Ahn’s patent describes an image sensor design that brings together isolated unit pixels and trench-integrated capacitor structures.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile