Cheonan, South Korea

Dae Il You

This inventor holds 1 USPTO granted patent. Top assignee: Sti, LLC. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dae Il You. Retrieved from https://idiyas.com/inventor/dae-il-you

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Dae Il You: Innovator in Display Device Manufacturing

Introduction

Dae Il You is a prominent inventor based in Cheonan, South Korea. He has made significant contributions to the field of display device manufacturing. His innovative work has led to the development of a unique adhesive layer forming apparatus.

Latest Patents

Dae Il You holds a patent for an "Adhesive layer forming apparatus and display device manufacturing system including the same." This invention discloses an apparatus that includes a first support chuck designed to move a first panel along a designated movement path. Additionally, it features a second support chuck that operates side by side with the first, allowing for the movement of a second panel. The system is equipped with a first gantry that moves a head to form an adhesive layer by jetting on either panel.

Career Highlights

Dae Il You is currently employed at Sti, LLC, where he continues to innovate in the field of display technology. His work has been instrumental in advancing manufacturing processes and improving product quality.

Collaborations

Dae Il You collaborates with talented coworkers, including Eun Su Jeon and Sang Pil Park. Their combined expertise contributes to the success of their projects and the advancement of technology in their field.

Conclusion

Dae Il You is a key figure in the innovation of display device manufacturing, with a focus on adhesive layer technology. His contributions are shaping the future of this industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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