Suwon, South Korea

Dae Eil Jo

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Kmw Inc. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dae Eil Jo. Retrieved from https://idiyas.com/inventor/dae-eil-jo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Dae Eil Jo: Innovator in Cavity Filter Technology

Introduction

Dae Eil Jo is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of telecommunications through his innovative designs. His work focuses on enhancing the efficiency and compactness of antenna systems.

Latest Patents

Dae Eil Jo holds a patent for a cavity filter. This invention features a slim and compact structure that incorporates a push-pin type RF connector. The design allows for the terminal to be exposed on both sides or one side in a height direction. This innovation reduces the size of antenna systems, facilitates quick verification for individual cavity filters, and ensures high reproducibility. It also enables easier mounting of the antenna system.

Career Highlights

Dae Eil Jo is associated with KMW Inc., a company known for its advancements in telecommunications technology. His work at KMW Inc. has positioned him as a key player in the development of innovative solutions in the industry.

Collaborations

Some of his notable coworkers include Duk Yong Kim and Sung Ho Jang. Their collaborative efforts contribute to the ongoing success and innovation at KMW Inc.

Conclusion

Dae Eil Jo's contributions to cavity filter technology exemplify his commitment to innovation in telecommunications. His work continues to influence the design and functionality of modern antenna systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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