Santa Clara, CA, United States of America

Da He

USPTO Granted Patents = 5 

Average Co-Inventor Count = 6.3

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022-2025

where 'Filed Patents' based on already Granted Patents

5 patents (USPTO):

Title: Innovations by Inventor Da He in Semiconductor Technology

Introduction

Da He is a prolific inventor based in Santa Clara, California, known for his significant contributions to the field of semiconductor technology. With four patents to his name, his innovative approaches focus on enhancing manufacturing processes and material properties.

Latest Patents

Among his latest patents is a groundbreaking method for minimizing feature-to-feature gap fill height variations. This method addresses a critical challenge in semiconductor fabrication by utilizing a tungsten halide soak treatment. By heating a substrate to approximately 350 to 450 degrees Celsius and exposing it to tungsten halide gas, Da He effectively reduces variations in gap fill height. The process involves a soak time of 5 to 60 seconds, followed by a metal preclean process and gap fill deposition on multiple features.

Another notable patent is centered on selective tungsten deposition at low temperatures. This invention outlines methods for depositing tungsten films while controlling reactant gas ratios. The methods promise to achieve selective deposition with lower roughness, stress, and impurity levels, making it a valuable advancement in semiconductor processing.

Career Highlights

Da He is currently associated with Applied Materials, Inc., where he continues to push the boundaries of innovation in semiconductor manufacturing. His expertise has positioned him as a vital player in the industry's development of advanced material deposition techniques.

Collaborations

Throughout his career, Da He has collaborated with talented colleagues, including Yi Xu and Yu Lei. These partnerships have fostered a collaborative environment, further driving the innovation landscape within Applied Materials, Inc.

Conclusion

Da He's contributions to the field of semiconductor technology illustrate the critical role of innovation in advancing manufacturing processes. His advancements in gap fill methodologies and selective tungsten deposition not only enhance production efficiency but also set new standards in the industry. As he continues to develop cutting-edge solutions, Da He remains a prominent figure among inventors shaping the future of semiconductor technology.

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