MULHOUSE, France

Céline Dietlin


 

Average Co-Inventor Count = 6.2

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Céline Dietlin

Introduction

Céline Dietlin is a notable inventor based in Mulhouse, France. He has made significant contributions to the field of photopolymerization and dental materials, holding two patents that showcase his innovative spirit and technical expertise.

Latest Patents

Céline Dietlin's latest patents include "Ultrafast cyclic ether-amine photopolyaddition and uses thereof." This invention relates to compositions that are self-thermally curable on demand under the triggering action of UV-visible to near-infrared irradiation of moderate intensity. The method allows for accelerated photopolyaddition of cyclic ether-amine resins or ultrafast dark curing of these resins. The invention also encompasses a resin casting, film or coated substrate, and an adhesive layer or bonding agent, comprising cyclic ether-amine resin obtained through the accelerated curing process. Additionally, it relates to the use of this composition for increasing the delamination strength of laminated composite materials. Another significant patent is for a "Dental impression material," which is a photocurable dental impression material designed for enhanced performance in dental applications.

Career Highlights

Céline Dietlin has worked with esteemed organizations such as the Centre National De La Recherche Scientifique and the Université De Haute Alsace. His work in these institutions has allowed him to develop and refine his innovative ideas, contributing to advancements in material science.

Collaborations

Céline has collaborated with notable colleagues, including Jacques Lalevée and Fabrice Morlet-Savary. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise.

Conclusion

Céline Dietlin's contributions to the fields of photopolymerization and dental materials highlight his innovative capabilities and dedication to advancing technology. His patents reflect a commitment to improving material performance and functionality in various applications.

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