This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignees: Fundacio Institut Catala De Nanociencia I Nanotecnologia (Icn2), Institucio Catalana De Recerca I Estudis Avancats, The University of Manchester. Active years: 2025.
Company Filing History:
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Years Active: 2025
Title: Cyrill Bussy: Innovator in Reduced Graphene Oxide Technology
Introduction
Cyrill Bussy is a notable inventor based in Salford, GB. He has made significant contributions to the field of materials science, particularly in the development of reduced graphene oxide (rGO) films. His innovative work has implications for various electronic applications.
Latest Patents
Cyrill Bussy holds a patent for a "Reduced graphene oxide film comprising a stack of rGO layers and its applications." This patent describes an rGO film with a total thickness ranging from 20 nm to 5 micrometers, consisting of a stack of rGO layers. The distance between two consecutive layers is specified to be from 0.2 to 0.7 nm. Additionally, the patent covers an electrically back-contacted conductive rGO structure, which includes an additional conductive support for the rGO deposition. The invention also outlines a process for preparing the rGO film and the conductive structure, along with its use in electronic devices for detecting, receiving, and inducing electrical signals. Cyrill Bussy has 1 patent to his name.
Career Highlights
Throughout his career, Cyrill Bussy has worked with prestigious institutions, including the Institució Catalana de Recerca i Estudis Avançats and The University of Manchester. His work in these organizations has allowed him to advance his research and contribute to the scientific community.
Collaborations
Cyrill has collaborated with notable colleagues such as José Antonio Garrido Ariza and Damià Viana. These partnerships have enriched his research and expanded the impact of his innovations.
Conclusion
Cyrill Bussy is a prominent figure in the field of graphene technology, with a focus on developing advanced materials for electronic applications. His contributions continue to influence the landscape of materials science and technology.