This inventor holds 1 USPTO granted patent. Top assignee: Komag Corporation. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: The Innovative Contributions of Curtis W. Fouyer
Introduction
Curtis W. Fouyer is a notable inventor based in Milpitas, California. He has made significant contributions to the field of surface polishing through his innovative patent. His work exemplifies the intersection of chemistry and engineering, showcasing the importance of novel solutions in industrial applications.
Latest Patents
Fouyer holds a patent for a slurry comprising a ligand or chelating agent for polishing a surface. This novel slurry is designed to enhance the polishing process by including a colloidal silica abrasive in an aqueous solution. The inclusion of a chelating agent, such as ammonium oxalate, is believed to effectively remove adsorbed ions from the surface being polished, particularly surfaces made of nickel. This innovation represents a significant advancement in polishing technology.
Career Highlights
Curtis W. Fouyer has dedicated his career to developing innovative solutions in the field of materials science. His work at Komag Corporation has allowed him to focus on creating effective polishing methods that improve surface quality in various applications. His patent reflects his commitment to advancing technology and enhancing manufacturing processes.
Collaborations
Throughout his career, Fouyer has collaborated with talented individuals such as Li Zhong Sun and Stanley M. Smith. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies. Working alongside skilled professionals has undoubtedly contributed to
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile