Louisville, KY, United States of America

Curtis McKenna

This inventor holds 1 USPTO granted patent. Top assignee: University Of Louisville Research Foundation, Inc.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Curtis McKenna. Retrieved from https://idiyas.com/inventor/curtis-mckenna

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Curtis McKenna: Innovator in Grayscale Lithography

Introduction

Curtis McKenna is a notable inventor based in Louisville, KY (US). He has made significant contributions to the field of grayscale lithography, particularly through his innovative patent. His work is instrumental in advancing technologies that rely on three-dimensional modeling.

Latest Patents

McKenna holds a patent for the "Automated generation of mask file from three-dimensional model for use in grayscale lithography." This invention provides a method, apparatus, and program product that automatically generates a grayscale lithography mask file from a three-dimensional model of a desired topography. This technology is particularly useful in applications generated by three-dimensional computer-aided design (CAD) tools.

Career Highlights

Curtis McKenna is affiliated with the University of Louisville Research Foundation, Inc. His role at this institution allows him to engage in cutting-edge research and development, contributing to advancements in various technological fields.

Collaborations

Throughout his career, McKenna has collaborated with notable colleagues, including James Loomis and Kevin M Walsh. These partnerships have fostered an environment of innovation and creativity, leading to impactful developments in their respective areas of expertise.

Conclusion

Curtis McKenna's contributions to grayscale lithography and his innovative patent demonstrate his commitment to advancing technology. His work continues to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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