Corrales, NM, United States of America

Craig Y Nakakura

This inventor holds 2 USPTO granted patents. Top assignee: National Technology & Engineering Solutions of Sandia, LLC. Active years: 2023-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Craig Y Nakakura. Retrieved from https://idiyas.com/inventor/craig-y-nakakura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023-2026

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Craig Y Nakakura: Innovator in Plasma-Based Circuit Delayering

Introduction

Craig Y Nakakura is a notable inventor based in Corrales, NM (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of circuit delayering. His innovative approach has led to advancements that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Craig Y Nakakura holds a patent for a plasma-based method for delayering circuits. This invention relates to methods of delayering a semiconductor integrated circuit die or wafer. The method includes exposing a die or wafer to plasma of an etching gas and detecting exposure of one or more metal layers within the die. In one aspect of the invention, the plasma of the etching gas is non-selective and removes all materials in a layer at about the same rate. In another aspect, two different plasmas of corresponding etching gases are employed, with each plasma being selective, necessitating the sequential use of both plasmas to remove all materials in a layer. This innovative method has the potential to streamline semiconductor processing and improve overall production quality.

Career Highlights

Craig is currently associated with National Technology & Engineering Solutions of Sandia, LLC, where he continues to work on cutting-edge technologies. His expertise in plasma-based methods has positioned him as a key player in the semiconductor industry. His contributions have not only advanced the field but have also paved the way for future innovations.

Collaborations

Craig has collaborated with several talented individuals in his field, including Randy J Shul and Caitlin Rochford Friedman. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of innovative solutions.

Conclusion

Craig Y Nakakura is a distinguished inventor whose work in plasma-based methods for delayering circuits has made a significant impact on semiconductor technology. His innovative approaches and collaborations continue to drive advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…