Company Filing History:
Years Active: 2004
Title: Craig Walker - Innovator in Ion Implantation Technology
Introduction
Craig Walker is a notable inventor based in Newton, NH (US). He has made significant contributions to the field of ion implantation technology, particularly through his innovative patent.
Latest Patents
Walker holds a patent for the "Faraday system for ion implanters." This system is designed to measure ion beam current in ion implanters or other ion beam treatment systems. The Faraday system includes a Faraday cup body that defines a chamber with an entrance aperture for receiving an ion beam. It features a suppression electrode positioned near the entrance aperture to create electric fields that inhibit the escape of electrons from the chamber. Additionally, a magnet assembly is included to produce magnetic fields for the same purpose. The design of the chamber allows for a relatively small ratio of chamber depth to entrance aperture width, enhancing its efficiency.
Career Highlights
Craig Walker is associated with Varian Semiconductor Equipment Associates, Inc., where he applies his expertise in semiconductor technology. His work has been instrumental in advancing ion implantation processes, which are critical in the manufacturing of semiconductors.
Collaborations
Some of his notable coworkers include Jack J. Bisson and Zhiyong Zhao, who have collaborated with him on various projects within the field.
Conclusion
Craig Walker's contributions to ion implantation technology through his innovative patent demonstrate his commitment to advancing the semiconductor industry. His work continues to influence the development of efficient ion beam treatment systems.