This inventor holds 1 USPTO granted patent. Top assignee: Harris Corporation. Active years: 1995.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1995
Title: Craig S Arruda: Innovator in Plasma Cleaning Technology
Introduction
Craig S Arruda is a notable inventor based in Palm Bay, FL (US). He has made significant contributions to the field of integrated circuit manufacturing through his innovative patent. His work focuses on enhancing the permanency of ink brands on integrated circuits (ICs) by utilizing advanced plasma cleaning methods.
Latest Patents
Craig S Arruda holds a patent for a "Plasma cleaning method for improved ink brand permanency on IC packages." This invention presents a gas phase plasma cleaning method and apparatus designed to remove contaminants from the surfaces of exposed metallic parts on integrated circuits. The method employs a two-step process using a defined gas mixture of argon and oxygen, along with ammonia and hydrogen. The argon-oxygen mixture effectively removes carbonatious material through chemical reactions and milling, while the ammonia-hydrogen mixture is utilized to chemically eliminate and reduce oxides and phosphates. This innovative approach increases surface energies, allowing for better adhesion of inks, and prevents the complete regrowth of the normally passivating oxide layer.
Career Highlights
Craig has dedicated his career to advancing technology in the semiconductor industry. His work at Harris Corporation has positioned him as a key player in the development of innovative solutions for integrated circuits. His patent reflects his commitment to improving manufacturing processes and product quality.
Collaborations
Throughout his career, Craig has collaborated with esteemed colleagues, including Jack H Linn and Martin E Walter. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Craig S Arruda's contributions to plasma cleaning technology have made a significant impact on the integrated circuit industry. His innovative methods enhance the quality and durability of IC packages, showcasing his dedication to advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile