Craig R Simpson

Title: The Innovations of Craig R Simpson

Introduction

Craig R Simpson is a notable inventor based in Danville, Vermont, with a remarkable portfolio of four patents. His work primarily focuses on advancements in lithography, a critical technology in the manufacturing of semiconductors and microelectronics.

Latest Patents

One of his latest patents is a reticle alignment system for use in lithography. This invention addresses misalignment errors in lithographic systems caused by environmental changes affecting the lens system. The system detects and corrects these errors by projecting a fiducial on the reticle adjacent to its working area through the lens. A metrology plate carried by the lens holds reference mirrors and detectors, which provide feedback on the extent of misalignment. The reticle is then adjusted using a reticle chuck with linear motors until proper alignment is achieved. Another significant patent is a platen for use with lithographic stages, which is constructed from a plurality of tiles featuring a uniformly spaced grid of teeth. These teeth are formed using powder metal technology and are designed to have low reluctance and high resistivity, ensuring optimal performance in lithographic applications.

Career Highlights

Throughout his career, Craig has contributed to various companies, including Mrs Technology, Inc. His innovative work has significantly impacted the field of lithography, enhancing the precision and efficiency of manufacturing processes.

Collaborations

Craig has collaborated with notable professionals in his field, including Robert A McEachern and Mark S Lucas. Their combined expertise has fostered advancements in lithographic technology.

Conclusion

Craig R Simpson's contributions to the field of lithography through his innovative patents demonstrate his commitment to advancing technology. His work continues to influence the industry, paving the way for future developments.