Lehighton, PA, United States of America

Craig N Bredbenner

This inventor holds 1 USPTO granted patent. Top assignee: At&t Bell Laboratories. Active years: 1990.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 69(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Craig N. Bredbenner

Introduction

Craig N. Bredbenner is a notable inventor based in Lehighton, PA (US). He has made significant contributions to the field of technology, particularly in the area of metal etching. His innovative approach has led to the development of a unique method that enhances the efficiency and precision of metal layer processing.

Latest Patents

Bredbenner holds a patent for a "Method for Tapered Etching." This patent describes a method for etching metal layers, including aluminum, to create tapered sidewalls. The technique utilizes trifluoromethane and chlorine in controlled amounts to achieve a tapered metal layer profile. This innovation is crucial for various applications in electronics and materials science.

Career Highlights

Craig N. Bredbenner is associated with AT&T Bell Laboratories, a renowned institution known for its groundbreaking research and development in telecommunications and technology. His work at this prestigious company has allowed him to collaborate with some of the brightest minds in the industry.

Collaborations

Some of his notable coworkers include Nur Selamoglu and Troy A. Giniecki. Their collective expertise has contributed to advancements in their respective fields and has fostered a collaborative environment that encourages innovation.

Conclusion

Craig N. Bredbenner's contributions to the field of metal etching exemplify the spirit of innovation. His patented method for tapered etching showcases his ability to solve complex problems in technology. Through his work at AT&T Bell Laboratories, he continues to influence the industry and inspire future inventors.

Profile summary based on public USPTO records.
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