Company Filing History:
Years Active: 2015
Title: The Innovations of Craig Macnaughton in Overlay Error Prediction
Introduction
Craig Macnaughton, an accomplished inventor based in Milpitas, California, holds one significant patent that has contributed to advancements in the field of semiconductor manufacturing. His innovative approach focuses on enhanced accuracy during lithography processes, addressing the crucial aspect of overlay errors.
Latest Patents
The patent held by Craig Macnaughton is titled "Statistical Overlay Error Prediction for Feed Forward and Feedback Correction of Overlay Errors, Root Cause Analysis and Process Control." This invention presents a sophisticated method to effectively collect data and train, validate, and deploy statistical models aimed at predicting overlay errors. It utilizes patterned wafer geometry data and relevant information, which includes selecting a training wafer set, measuring at multiple lithography steps, and calculating geometry differences. Moreover, the process involves applying a variety of predictive models to these geometry differences and comparing the predicted overlay to measured values on the training wafer set. Ultimately, the most accurate predictive model is identified, and the results are fed-forward to the lithography scanner tool, enabling corrections for overlay errors during the wafer scan-and-expose processes.
Career Highlights
Currently, Craig Macnaughton holds a pivotal role at KLA-Tencor Corporation, a company renowned for its advanced process control and yield management solutions for the semiconductor industry. His expertise and contributions significantly enhance the company's innovation capabilities in lithography processes, ultimately leading to more precise manufacturing outcomes.
Collaborations
Craig collaborates closely with fellow professionals such as Wei Chang and Krishna Rao, who share his commitment to advancing technologies in lithography and semiconductor manufacturing. Working together with experienced industry colleagues fosters an environment of innovation and continuous improvement in their field.
Conclusion
Craig Macnaughton's contributions to the innovation landscape, particularly through his patent on statistical overlay error prediction, reflect his dedication to improving semiconductor manufacturing processes. As a vital part of KLA-Tencor Corporation, he continues to make strides in addressing complex challenges within the industry. His work not only enhances the efficacy of production but also paves the way for future innovations in the realm of overlay error management.